Near-field spectroscopy of silicon dioxide thin films

Near-field spectroscopy of silicon dioxide thin films

08.27.17 //

Authors: L. M. Zhang, G. O. Andreev, Z. Fei, A. S. McLeod, G. Dominguez, M. Thiemens, A. H. Castro-Neto, D. N. Basov, M. M. Fogler

Journal: Physical Review B / DOI: 10.1103/PhysRevB.85.075419

Year: 2012

Applications: Nanoscale


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